https://www.idonus.com/index.php?path=products&category=UV-EXP
UV-LED exposure systems for photolithography (UV-EXP series)
With the UV-EXP series, idonus offers an innovative UV illumination system based on the use of high-power LEDs and high-grade homogenization optics. This product line finds application in photoresist exposure (UV-LED photolithogaphy and curing) and is suitable for a wide variety of substrates and photoresists used in MEMS, microfluidics, photonics, semiconductors and photovoltaic applications. Our standard line of UV illumination products addresses photolithography needs for masks and wafers up to 300 mm wide (11.8 inches).
Customized solutions can be designed to suit your specific requirements (e.g., retrofitting of mask aligners, OEM for your future products). For further details on UV-LED retrofittings and custom exposure systems, see also our solutions > technologies page.
https://www.idonus.com/index.php?path=products&category=VPE
HF Vapor Phase Etcher (VPE series)
The VPE consists of a reaction chamber and a lid. A heating element is integrated in the lid. It controls the temperature of the substrate to be etched. Wafer clamping can be achieved in two ways: Wafers can be clamped mechanically by using the clamping ring. The screwing is done from the backside of the apparatus, which is never in contact with the Hydrofluoric acid (HF) vapor. The 3 nuts are easy to handle with protection gloves. The other option is electrostatic clamping. Single chips (longer than 10 mm) as well as wafers can be clamped to the heating element. The backside of the wafer is protected from etching.
